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深圳维尔克斯光电有限公司

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维尔克斯光电提供磁光测量仪器 磁光克尔效应测量仪 NEOARK代理

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  • 品  牌:
  • NEOARK
  • 主要规格:
  • 磁域观测显微镜(Kerr显微镜,磁光克尔效应显微镜)
  • 用  途:
  • 测量磁光克尔效应
    • 维尔克斯光电提供磁光测量仪器 磁光克尔效应测量仪 NEOARK代理。维尔克斯光电专业代理NEOARK磁光测量系统,磁光克尔效应测量仪,Magneto-Optical Product。磁光测量主要包括磁光克尔效应测量(μ-Kerr Effect)、磁滞回线测量和法拉第效应测量。 日本NEOARK公司成立于1976年,是一家专业从事精密仪器仪表、激光器的高科技公司,在磁光测试领域拥有雄厚的技术实力。Neoark公司 产品产品范围包括:激光光源,激光测量(激光扫描仪、激光光谱分析仪、功率计、激光探测器),激光打标,位移测量仪,振动仪,激光微处理器,激光直接光刻系统,磁光/偏振特性测量等。其中以碘稳频激光器和磁光测量仪器最为出名。维尔克斯光电专业代理NEOARK磁光测量仪器在中国市场的销售。 磁光效应测量系统 Magneto-Optical Effect Measurement System 维尔克斯光电提供磁光测量仪器 磁光克尔效应测量仪 NEOARK代理 关键词:磁光克尔效应 磁滞回线测量: 极性克尔效应(垂直磁化) 纵向克尔效应(平面磁化) 克尔效应测量显微镜 低温 法拉第效应测量 垂直磁各向异性分析(磁场应用的角度依赖性) 在平面磁各向异性分析(磁场应用的角度依赖性) 在平面的倾斜角度评价 磁域观测显微镜(Kerr显微镜,磁光克尔效应显微镜) 应用:显微镜磁域观察 极克尔效应(垂直磁化) 纵向克尔效应(平面磁化) 低温 磁光效应测量系统 关键词:磁滞回线测量 晶圆 磁记忆 硬盘磁头 磁传感器 硬盘 垂直磁记录介质 软衬层(SUL) 头装置 热辅助磁记录(HAMR)硬盘媒体 μ-Kerr Effect Measurement And Magnetic Domain Observation System BH-PI7892 Series μ-Kerr Effect Measurement System BH-PI920 Series Features Microscopic Local Magnetic Property Analysis based on both Polar and Longitudinal Kerr Effect(Not simultaneous measurement) Suitable for sensitive analysis of μm size magnetic pattern and magnetic thin film Specification Measurement Subject: Magneto-Optical Kerr Effect (Polar and Longitudinal Kerr Effect) Main Function: Kerr Loop Measurement Light Source: Diode Laser Probe Light Spot: φ2-5μm Generating Magnetic Field: Max. ±10kOe (1T) *Option: In-Plane Electromagnet μ-Kerr Effect Measurement and Magnetic Domain Observation System BH-PI7892 Series μ-Kerr Effect Measurement and Magnetic Domain Observation System BH-PI7892 Series Longitudinal Kerr Effect Measurement System BH-618 Series Faraday Effect Measurement System BH-620 Series Perpendicular Magnetic Anisotropy Analysis Features Magneto-Optical Kerr Effect with motorized rotating Electromagnet for Magnetic Field Applied Angle Dependence Analysis In-Plane Magnetic Anisotropy & Skew Angle Analysis *Magnetic Field Application Angle Dependence Analysis (Magnetic Field Application Direction: In-Plane Direction) “For Wafer” Perpendicular Magnetic Layer Evaluation System Model: BH-810CPC25WF12 Features Specially Designed for evaluation of Perpendicular Magnetic Layer of 12 Inch Wafer Specification Main Function: Kerr Loop Measurement and Mapping Measurement (Polar Kerr Effect) Light Source: Diode Laser Probe Light Spot Size: φ1mm (Typ.) Generating Magnetic Field: Max. ± 25Oe (2.5T) “For Wafer” In-Plane Magnetic Layer Evaluation System Model: BH-618SK-12 “For Hard Disc” Perpendicular Magnetic Recording Layer Evaluation System Model: BH-810CPC “For Hard Disc” Soft Under Layer (SUL) Evaluation System Model: BH-618HS Features: Specially Designed for evaluation of Soft Under Layer (SUL) of both 2.5 inch and 3.5 Inch Hard Disk Magnetic Domain Observation Microscope BH-786 Series Features Magnetic Domain Observation Microscope (Kerr Microscope) with various optional magnification and magnetic field Specification Observation Subject: Magneto-Optical Kerr Effect (Polar and Longitudinal Kerr Effect) Main Function: CCD Camera Observation and Image Capturing Light Source: Mercury Lamp Observation Resolution: 1μm (Typ.) with x50 Objective Lens Observation Area: 100 x 70μm with x50 Objective Lens Generating Magnetic Field: > ± 10kOe (1T) *Option: In-Plane Electromagnet and Others Low Temperature Magnetic Domain Observation Microscope BH-7850 Series

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